Pellicle Inspection and Pellicle Mounting System for CLIOS
71PA CM
Enabling automated pellicle inspection and mounting in combination with CLIOS for G10.5
Topics
Features
- Applicable to pellicles in various sizes up to Generation 10.5
- Minimizing mask contamination risk by remote operation of pellicle mounting immediately after mask inspection completion
- Enabling high-precision pellicle positioning by alignment camera
- Particle inspection function enables the inspection of both surface and backside of pellicles (optional)
- A pellicle is tentatively mounted on mask and then pressed uniformly with controlled pressure level and pressing time by the pressing machine.
Applications
- Inspection, auto transfer and mounting of pellicles during FPD photomask manufacturing
Specifications
Applicable pellicle size | Multiple pellicle sizes up to G10.5 |
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Inspection time | 35 minutes (G10.5 pellicle) |
Sensitivity | 5µm |
Inspection area | Whole pellicle excluding the area within 5mm from edge |
Dimensions | 3,200mm (W) x 4,000mm (D) x 3,700mm (H) |
Weight | Approximately 1,700kg |