Actinic EUV Patterned Mask Inspection System
ACTIS A150
World’s first EUV patterned mask inspection system
Topics
Features
- EUV light source (13.5nm) delivering significantly higher defect sensitivity compared with conventional DUV light source
- Actinic inspection with the same wavelength of EUV lithography enabling the detection of printable defects on wafer
- Through-pellicle EUV mask inspection
Applications
- Quality assurance in EUV mask manufacturing process
- Incoming EUV mask inspection and periodic quality assurance at wafer fabs
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