EUV mask

Description

Photomask used for EUV lithography. Since EUV light can hardly pass through any material, EUV masks are reflective masks used in combination with reflective optics. An EUV mask is manufactured by forming an absorber pattern on a EUV mask blank.

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Mask inspection system for pellicle-less EUV mask and optical mask inspection in the technology nodes of 7nm, 5nm, and 3nm

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