Description
EUV is an abbreviation of Extreme Ultraviolet. Exposure light source. Light wavelength: 13.5nm
World’s first EUV patterned mask inspection system
Detecting printable phase defects and enabling defect management for EUV mask blanks
Mask inspection system for pellicle-less EUV mask and optical mask inspection in the technology nodes of 7nm, 5nm, and 3nm
A collection of technical words often used with Lasertec products and technologies
Schedule of events where Lasertec will exibit products
