Resist
Description
Photo-reactive materials that are used to transfer circuit patterns on a photomask to a wafer. It is coated on a wafer before the exposure. Typically it is classified into two kind: positive and negative.
Description
Photo-reactive materials that are used to transfer circuit patterns on a photomask to a wafer. It is coated on a wafer before the exposure. Typically it is classified into two kind: positive and negative.