Description

Photomask consists of one film layer formed on a transparent glass substrate, the one film layer having electronic circuit pattern. Photomask plays a role of an original plate for forming electronic pattern on wafer.
Photomask is sometimes called simply "mask" or is called "reticle." Photomask is used not only for the manufacturing of semiconductor devices but also for manufacturing of numerous products such as FPD, which employs photo-process.