Lasertec has gained recognition from wafer fabs and mask shops worldwide for its timely provision of solutions to various EUV mask inspection needs. In recent years, the expansion of the EUV market has led to an increase in demand for inspection of EUV pellicles. The newly released PELMIS Series detects particles on the surface of pellicles attached to EUV masks and performs automatic classification of whether they are on the front or the back side of the pellicle. PELMIS can also detect particles on the pattern surface and its peripheral areas of EUV masks, making it a useful tool in various applications.

The PELMIS Series is expected to bring optimum productivity to pelliclized EUV mask inspection processes and enable inspection of the entire EUV mask when used in combination with the ACTIS Series Actinic² EUV Patterned Mask Inspection System, the BASIC Series EUV Mask Backside Inspection and Cleaning System and the MZ Series Mask Edge Inspection System.

Lasertec will continue to enhance its lineup of inspection systems to meet the needs of leading-edge semiconductor manufacturers adopting EUV lithography for high-volume manufacturing, thereby facilitating the advancement of the semiconductor industry.