The semiconductor industry is expected to keep improving its manufacturing processes to pursue the production of smaller geometry devices to achieve higher performance, faster speed, and better energy efficiency. ACTIS A150 actinic EUV patterned mask inspection system provided by Lasertec has been facilitating the adoption of EUV lithography to high-volume manufacturing. It is renowned for its excellent inspection performance in the industry today.

The newly released ACTIS A300 is a next-generation model that meets the requirements of manufacturing processes using high-NA EUV lithography to enable the further miniaturization of device geometries.

The A300 series uses newly designed optics and high-brightness light source “URASHIMA”. It achieves a significant improvement in defect detection performance compared to the A150 series.

The anamorphic optics used in high-NA lithography have adopted different magnifications of projection in the X and Y directions. Inspection of EUV masks for high-NA lithography, therefore, requires different levels of resolution in the two directions. The A300 series can also be used to inspect EUV masks for the current NA lithography as well as EUV masks for high-NA lithography.

Lasertec is dedicated to supporting the needs of leading-edge semiconductor manufacturers, developing unique solutions, and facilitating quality and productivity improvement, thereby contributing to the advancement of the industry.